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High contrast ratio membrane mask

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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High numerical aperture projection system for extreme ultraviole

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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High resolution X-ray lithography using phase shift masks

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Holding mechanism, and exposure apparatus using the mechanism

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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