Substrate holding system and exposure apparatus having the same

Details Substrate holding system and exposure apparatus having the same Substrate holding system and exposure apparatus having the same

1995-03-28

1996-12-17

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

269 21, H01L 2168

Patent

active

055861598

ABSTRACT:
A substrate holding system includes a holding mechanism for holding a substrate through vacuum attraction, a vacuum evacuating device for supplying a vacuum to the holding mechanism, a first voltage source for supplying electric power to the vacuum evacuating device, a second voltage source, separate from the first voltage source, for supplying electric power to the vacuum evacuating device, and a controller for energizing the vacuum evacuating device at a higher evacuation capacity level, when the first voltage source is in operable order, and for energizing the vacuum evacuating device at a lower evacuation capacity level, when the second voltage source supplies electric power to the vacuum evacuating device, and the first voltage source is not in operable order.

REFERENCES:
patent: 4391511 (1983-07-01), Akiyama et al.
patent: 5160961 (1992-11-01), Marumo et al.
patent: 5161177 (1992-11-01), Chiba
patent: 5191218 (1993-03-01), Mori et al.
patent: 5197089 (1993-03-01), Baker
patent: 5203547 (1993-04-01), Marumo
patent: 5226523 (1993-07-01), Kawakami et al.
patent: 5231291 (1993-07-01), Amemiya et al.
patent: 5329126 (1994-07-01), Amemiya et al.
patent: 5417408 (1995-05-01), Ueda

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