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Target positioning for minimum debris

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Three-mirror system for lithographic projection, and projection

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Transmission system for synchrotron radiation light

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Transmission system for synchrotron radiation light

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Tungsten absorber for x-ray mask

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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