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Plasma treatment method to reduce silicon erosion over HDI...

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
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Plasma treatment of a semiconductor surface for enhanced...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma treatment of a semiconductor surface for enhanced...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma treatment of an interconnect surface during formation of

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma treatment of low dielectric constant dielectric...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma treatment of low dielectric constant dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma treatment of tantalum nitride compound films formed...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma treatment system

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma treatment system and method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma treatment to enhance inorganic dielectric adhesion to...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma treatment to enhance inorganic dielectric adhesion to...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma treatment to improve barrier layer performance over...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma treatment to improve DUV photoresist process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma treatment to reduce stress corrosion induced voiding...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma-aided treatment of surfaces against bacterial attachment

Semiconductor device manufacturing: process – Having biomaterial component or integrated with living organism
Patent

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Plasma-assisted doping

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into...
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Plasma-enhanced ALD of tantalum nitride films

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma-enhanced chemical vapor deposition (CVD) method to...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma-enhanced chemical vapor deposition of a metal nitride...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma-enhanced chemical vapor deposition of a nucleation...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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