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Methods of fabricating integrated circuit memory devices having

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Methods of fabricating isolation structures in epi-less...

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Methods of forming field oxide and active area regions on a semi

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Methods of forming field oxide and active area regions on a...

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Methods of forming field oxide and active area regions on a...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Methods of forming field oxide isolation regions with reduced su

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Methods of forming flash devices with shared word lines

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Methods of forming integrated circuitry, and methods of...

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Methods of forming integrated semiconductor devices having impro

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Methods of forming oxide isolation regions for integrated circui

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Microelectromechanical system microphone fabrication...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Microelectromechanical system microphone fabrication...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Microfeature workpiece processing apparatus and methods for...

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Microfeature workpiece processing apparatus and methods for...

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Modified LOCOS isolation process for semiconductor devices

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Modified LOCOS process for sub-half-micron technology

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Multiple local oxidation for surface micromachining

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Narrow deep trench isolation process with trench filling by oxid

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Nitridation assisted polysilicon sidewall protection in self-ali

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Nitrogen implantation using a shadow effect to control gate...

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