Strain-silicon CMOS using etch-stop layer and method of...

Stress management of barrier metal for resolving CU line...

Stress relaxation, selective nitride phase removal

Stress released VLSI structure by void formation

Stress-relief layers and stress-compensation collars with...

Stress-relief layers and stress-compensation collars with...

Strip conductor arrangement and method for producing a strip...

Stripping and cleaning agent for removing dry-etching and photor

Structural element and process for its production including...

Structural reinforcement of highly porous low k dielectric...

Structure and fabrication method for stackable, air-gap-containi

Structure and manufacturing process of localized shunt to...

Structure and method for a CMOS device with doped conducting...

Structure and method for bond pads of copper-metallized...

Structure and method for contact pads having a recessed...

Structure and method for contact pads having a recessed...

Structure and method for controlling copper diffusion and for ut

Structure and method for creating reliable via contacts for...

Structure and method for eliminating metal contact to P-well...

Structure and method for enhancing resistance to fracture of...