Protection low-k ILD during damascene processing with thin...

Protection of conductors from oxidation in deposition chambers

Protection of Cu damascene interconnects by formation of a...

Protection of Cu damascene interconnects by formation of a...

Protective hardmask for producing interconnect structures

Protective layer having compression stress on titanium layer...

Protective layers prior to alternating layer deposition

Protective layers prior to alternating layer deposition

Protective oxide buffer layer for ARC removal

Protective self-aligned buffer layers for damascene...

Protective self-aligned buffer layers for damascene...

Protective self-aligned buffer layers for damascene...

Pseudo hybrid structure for low K interconnect integration

Pulsed laser deposition of transparent conducting thin films...

Pulsed laser salicidation for fabrication of ultra-thin silicide

Purge in silicide deposition processes dichlorosilane

Purge step-controlled sequence of processing semiconductor...

PVD deposition process for CVD aluminum liner processing

PVD deposition process for enhanced properties of metal films

PVD-based metallization methods for fabrication of...