Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent
1995-11-02
1998-07-28
Dang, Thi
Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
156345, 118723I, 438729, 20419212, 20429808, 20429834, H05H 100
Patent
active
057858780
ABSTRACT:
A high temperature, oxidation resistant coating is provided for an RF antenna used in semiconductor processing. In a preferred embodiment, the coating is made of nickel to protect the antenna against oxidation at high temperatures.
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Applied Materials Inc.
Dang Thi
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