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Magnetron sputtering method and apparatus utilizing a pulsed ene

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering method and sputtering target

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering of magnetic materials

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
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Magnetron sputtering source

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron sputtering source

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron sputtering source

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron sputtering source and method of use thereof

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering source and method of use thereof

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering source enclosed by a mirror-finished...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron sputtering source for low pressure operation

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering system

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron sputtering system and photomask blank production...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering systems including anodic gas...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering target and cathode assembly

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron sputtering target for magnetic materials

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron sputtering target for reduced contamination

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering targets

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron type sputtering cathode

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron with a rotating center magnet for a vault shaped...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Magnetron with controlled DC power

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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