Magnetron sputtering target and cathode assembly

Details Magnetron sputtering target and cathode assembly Magnetron sputtering target and cathode assembly

1978-11-06

1980-04-15

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

041982835

ABSTRACT:
A magnetron cathode assembly for use in a cathode sputtering apparatus includes a support means for a rectangular frame-like annular target and spaced apart inner and outer pole pieces fastened to the support member and providing a rectangular annular channel for mounting the target in electrically and thermally conductive contact with the support means. Preferably, the target is a set of four straight bars shaped at the ends to assemble together as a rectangular frame. Target bars having a symmetrical hourglass cross section with overhanging flanged side portions adjacent to front and rear faces are adapted to be reversibly clamped to the support means by the inner and outer poles for simple and rapid replacement in the field, said hourglass shape providing maximum utilization of target material.

REFERENCES:
patent: 4100055 (1978-07-01), Rainey
patent: 4116806 (1978-09-01), Love et al.

Affiliated with

Also associated with

Rating

Magnetron sputtering target and cathode assembly does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetron sputtering target and cathode assembly, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron sputtering target and cathode assembly will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-475096