Magnetron sputtering targets

Details Magnetron sputtering targets Magnetron sputtering targets

1987-07-01

1989-05-30

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20412912, C23C 1434

Patent

active

048348600

ABSTRACT:
A magnetron sputter coating device having a target of material to be sputtered and a magnetic means for producing a closed-loop magnetic tunnel capable of confining a glow discharge adjacent a surface of the target is disclosed. A groove is provided in the surface of the target along at least part of the erosion region. The groove affects the sputtering voltage and profile of the sputtering surfaces as it erodes. The dimensions and locations of the groove can be selected to optimize the effects for particular magnetron sputtering devices.

REFERENCES:
patent: 4324631 (1982-04-01), Meckel et al.
patent: 4414087 (1983-11-01), Meckel
patent: 4487675 (1984-12-01), Meckel
patent: 4547279 (1985-10-01), Kiyota et al.
patent: 4564435 (1986-01-01), Wickersham
patent: 4604180 (1986-08-01), Hirukawa et al.
patent: 4610770 (1986-09-01), Saito et al.
patent: 4610774 (1986-09-01), Sakata et al.

Affiliated with

Also associated with

Rating

Magnetron sputtering targets does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetron sputtering targets, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron sputtering targets will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2150317