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Composite sputter target and phosphor deposition method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Composite sputtering target structures and process for producing

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Conductive catalyst particles and process for production...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Configuration for coating a substrate by means of a...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Configuration for the execution of a plasma based sputter...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Confined ion beam sputtering device and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Conmag shield

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Contamination controlling method and apparatus for a plasma...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Contamination-resistant thin film deposition method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Continuous deposition of insulating material using multiple anod

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Continuous forming method for TI/TIN film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Continuous process for forming improved titanium nitride barrier

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Control of solid state dimensional features

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Control of solid state dimensional features

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Control of the surface roughness of magnetic disk

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Controllably monitoring and reducing a material

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Controlled gas supply line apparatus and process for infilm...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Controlled isotropy reactive ion etcher for multi-stepped sloped

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Controlled magnetron shape for uniformly sputtered thin film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cooling system for magnetron sputtering apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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