Fabrication of deep submicron structures and quantum wire...
Fabrication of electronic circuit elements using unpatterned...
Fabrication of FinFETs with multiple fin heights
Fabrication of gate dielectric in nonvolatile memories in...
Fabrication of gate dielectric in nonvolatile memories...
Fabrication of high power semiconductor device with a heat...
Fabrication of integrated circuit inter-level dielectrics using
Fabrication of integrated circuits on both sides of a...
Fabrication of integrated circuits with borderless vias
Fabrication of integrated devices using nitrogen implantation
Fabrication of local damascene finFETs using contact type...
Fabrication of low power CMOS device with high reliability
Fabrication of low resistance, non-alloyed, ohmic contacts...
Fabrication of low resistance, non-alloyed, OHMIC contacts...
Fabrication of MEMS devices with spin-on glass
Fabrication of metal film stacks having improved bottom...
Fabrication of mid-cap metal gates compatible with ultra-thin di
Fabrication of nanoporous antireflection film
Fabrication of organic light emitting diode using selective...
Fabrication of phase change memory element with phase-change...