Fabrication of low resistance, non-alloyed, ohmic contacts...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Heterojunction formed between semiconductor materials which...

Reexamination Certificate

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C257S201000, C257S743000

Reexamination Certificate

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06894325

ABSTRACT:
A method of reducing the specific contact resistivity of a metal to semiconductor interface between a metal contact and an InP semiconductor compound. The method includes the step of increasing the amount of the group V element (P) in the semiconductor compound so that the semiconductor compound is non-stoichiometric having an excess concentration of the group V element in an amount of at least 0.1% above stoichiometric levels.

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Docter, D.P., et al., “New Results for Nonstoichiometric InP Grown by Low Temperature MBE,”10th Intern. Conf. On Indium Phosphide and Related Materials, Tsukuba, Japan, pp 53-56 (May 11-15, 1998).
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