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CVD plasma assisted low dielectric constant films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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CVD plasma assisted low dielectric constant films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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CVD plasma assisted low dielectric constant films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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CVD plasma assisted low dielectric constant films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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CVD plasma assisted lower dielectric constant SICOH film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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CVD plasma assisted lower dielectric constant sicoh film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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CVD plasma assisted lower dielectric constant SICOH film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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CVD plasma process to fill contact hole in damascene process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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CVD process for DCS-based tungsten silicide

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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CVD reactor and process for producing an epitally coated...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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CVD syntheses of silicon nitride materials

Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
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CVD Ta2O5/oxynitride stacked gate insulator with TiN gate...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CVD tin barrier layer for reduced electromigration of aluminum p

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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CVD Tin Barrier process with improved contact resistance

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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CVD TiSiN barrier for copper integration

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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CVD TiSiN barrier for copper integration

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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CVD titanium silicide for contact hole plugs

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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CVD titanium silicide for contract hole plugs

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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CVD-based process for manufacturing stable low-resistivity...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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CVD-PVD deposition process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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