Apparatus and method for nanoscale pattern generation
Effect of substrate surface treatment on 193 NM resist...
Gate pattern formation using a bottom anti-reflective coating
Lateral-only photoresist trimming for sub-80 nm gate stack
Manufacturing process for semiconductor device, photomask,...
Manufacturing use of photomasks with an opaque pattern...
Mask design and method for controlled profile fabrication
Method and apparatus for adjusting feature size and position
Method and apparatus for adjusting feature size and position
Method and system for decreasing the spaces between wordlines
Method for etching an anti-reflective coating
Method for fabricating positionally exact surface-wide...
Method for manufacturing semiconductor device using multiple...
Method of fabricating a feature in an integrated circuit...
Method of fabricating a vertically profiled electrode and...
Method of fabricating next-to-minimum-size transistor gate using
Method of making integrated circuit with closely spaced...
Method to control critical dimension of a hard masked pattern
Methods for treating a deep-UV resist mask prior to gate...
Pattern design method for lithography C/H process