Apparatus and method for nanoscale pattern generation

Details Apparatus and method for nanoscale pattern generation Apparatus and method for nanoscale pattern generation

2006-03-28

2006-03-28

Nelms, David (Department: 2818)

Semiconductor device manufacturing: process

Masking

C438S736000, C438S738000, C438S742000, C438S743000, C438S744000, C438S780000

Reexamination Certificate

active

07018944

ABSTRACT:
A method and apparatus that produces highly ordered, nanosized particle arrays on various substrates. These regular arrays may be used as masks to deposit and grow other nanoscale materials.

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