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Method of reducing particles during the manufacturing of fin or

Semiconductor device manufacturing: process – Making passive device – Stacked capacitor
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Method of spacing a capacitor from a contact site

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Method to achieve rough silicon surface on both sides of...

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Method to fabricate capacitor structures with very narrow featur

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Method to fabricate electrodes for high-K dielectrics

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Method to fabricate high reliable metal capacitor within...

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Method to fabricate MIM capacitor with a curvillnear surface...

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Method to form a corrugated structure for enhanced capacitance

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Method to form a corrugated structure for enhanced...

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Method to form a ragged poly-Si structure for high density DRAM

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Method to form bottom electrode of capacitor

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Method to form hemi-spherical grain (HSG) silicon from amorphous

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Method to increase DRAM capacitor via rough surface storage node

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Method to prepare hemi-spherical grain (HSG) silicon using a flu

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Method to reduce aspect ratio of DRAM peripheral contact

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Method to reduce floating grain defects in dual-sided...

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Method to thermally form hemispherical grain (HSG) silicon to en

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Method to thermally form hemispherical grain (HSG) silicon to en

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Methods for fabricating CVD TiN barrier layers for capacitor str

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Methods for fabricating integrated circuit capacitor...

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