Use of intersecting subresolution features for microlithography

Details Use of intersecting subresolution features for microlithography Use of intersecting subresolution features for microlithography

1999-06-25

2000-10-31

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061399949

ABSTRACT:
A method for creating an image on an image plane utilizing a photomask comprised of a plurality of intersecting subresolution features. Energy created by an energy source is projected through the subresolution features which diffract the light to produce constructive or positive interference thereby resulting in an image being formed on the image plane that is different than the image or pattern of subresolution features on the photomask.

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