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Fluorinated polymers for use in immersion lithography

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Fluorinated polymers having ester groups and photoresists...

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Fluorinated polymers having polycyclic groups with fused...

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Fluorinated polymers, photoresists and processes for...

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Fluorinated polymers, photoresists and processes for...

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Fluorinated silsesquioxane polymers and use thereof in...

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Fluorinated vinyl ethers, copolymers thereof, and use in...

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Fluorinated vinyl ethers, copolymers thereof, and use in...

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Fluorine-containing compound, resist composition for...

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Fluorine-containing compound, resist composition for...

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Fluorine-containing cyclic compound, fluorine-containing...

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Fluorine-containing ethylenic monomer having hydroxyl group...

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Fluorine-containing photoresist having reactive anchors for...

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Fluorine-containing photosensitive polymer having hydrate...

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Fluorine-containing polymer having acid-reactive group and...

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Fluorine-containing silicon compounds, silicone resins,...

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Fluorine-containing styrene acrylate copolymers and use...

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Fluorine-free heteroaromatic photoacid generators and...

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Fluoro-containing photosensitive polymer and photoresist...

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Fluoroaliphatic group-containing copolymer

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