Fluorinated polymers for use in immersion lithography
Fluorinated polymers having ester groups and photoresists...
Fluorinated polymers having polycyclic groups with fused...
Fluorinated polymers, photoresists and processes for...
Fluorinated polymers, photoresists and processes for...
Fluorinated silsesquioxane polymers and use thereof in...
Fluorinated vinyl ethers, copolymers thereof, and use in...
Fluorinated vinyl ethers, copolymers thereof, and use in...
Fluorine-containing compound, resist composition for...
Fluorine-containing compound, resist composition for...
Fluorine-containing cyclic compound, fluorine-containing...
Fluorine-containing ethylenic monomer having hydroxyl group...
Fluorine-containing photoresist having reactive anchors for...
Fluorine-containing photosensitive polymer having hydrate...
Fluorine-containing polymer having acid-reactive group and...
Fluorine-containing silicon compounds, silicone resins,...
Fluorine-containing styrene acrylate copolymers and use...
Fluorine-free heteroaromatic photoacid generators and...
Fluoro-containing photosensitive polymer and photoresist...
Fluoroaliphatic group-containing copolymer