Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-08-02
2011-08-02
Walke, Amanda C. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S945000, C430S311000, C430S396000
Reexamination Certificate
active
07989138
ABSTRACT:
A fluorine-containing compound represented by a general formula (c-1) shown below:in-line-formulae description="In-line Formulae" end="lead"?[Chemical Formula 1]in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?RX-AN-(OR2)a (c-1)in-line-formulae description="In-line Formulae" end="tail"?[wherein, RXrepresents an organic group, ANrepresents a naphthalene ring that may have a substituent, R2represents a base dissociable group, and a represents 1 or 2, provided that at least one among ANand said a R2groups contains a fluorine atom].
REFERENCES:
patent: 5773191 (1998-06-01), Padmanaban et al.
patent: 5945517 (1999-08-01), Nitta et al.
patent: 6005137 (1999-12-01), Moore et al.
patent: 6153733 (2000-11-01), Yukawa et al.
patent: 6610456 (2003-08-01), Allen et al.
patent: 6773862 (2004-08-01), Shirakawa et al.
patent: 7105270 (2006-09-01), Fujita et al.
patent: 7521168 (2009-04-01), Mizutani et al.
patent: 7569326 (2009-08-01), Ohsawa et al.
patent: 7592125 (2009-09-01), Suzuki et al.
patent: 2003/0236369 (2003-12-01), Komoriya et al.
patent: 2005/0019690 (2005-01-01), Kodama
patent: 2008/0096134 (2008-04-01), Sugimoto et al.
patent: 1835342 (2007-09-01), None
patent: H09-208554 (1997-08-01), None
patent: H11-035551 (1999-02-01), None
patent: H11-035552 (1999-02-01), None
patent: H11-035573 (1999-02-01), None
patent: H11-322707 (1999-11-01), None
patent: WO 2004/074242 (2004-09-01), None
D. Gil et al., “First Microprocessors with Immersion Lithograhy,” Optical Microlithography XVIII, Proceedings of SPIE vol. 5754, pp. 119-128 (2005).
Shun-Ichi Kodama et al., “Synthesis of Novel Fluoropolymer for 157nm Photoresists by Cyclo-polymerization.” Advances in Resist Technology and Processing XIX, Proceedings of SPIE vol. 4690 (2002).
Dazai Takahiro
Furuya Sanae
Hirano Tomoyuki
Mori Takayoshi
Takasu Ryoichi
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
Walke Amanda C.
LandOfFree
Fluorine-containing compound, resist composition for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fluorine-containing compound, resist composition for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorine-containing compound, resist composition for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2705519