Fluorine-free heteroaromatic photoacid generators and...

Details Fluorine-free heteroaromatic photoacid generators and... Fluorine-free heteroaromatic photoacid generators and...

2008-01-16

2011-10-11

Kelly, Cynthia (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S313000, C430S921000, C430S922000, C562S030000

Reexamination Certificate

active

08034533

ABSTRACT:
Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free heteroaromatic sulfonate anionic component. The photoacid generators preferably contain an onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer. The compositions are especially useful for forming material patterns using 193 nm (ArF) imaging radiation.

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International Search Report and WO-PCT/US2009/030789 Inter'l filing date: Jan. 13, 2009.

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