Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-03-29
2011-03-29
Walke, Amanda C. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S905000, C430S945000
Reexamination Certificate
active
07914967
ABSTRACT:
A resist composition for immersion exposure including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon irradiation, and a fluorine-containing compound (C) having a group represented by general formula (c) shown below and containing at least one fluorine atom:wherein Q represents a group in which one hydrogen atom has been removed from a monovalent hydrophilic group; and R1represents a hydrocarbon group of 2 or more carbon atoms which may have a fluorine atom.
REFERENCES:
patent: 5773191 (1998-06-01), Padmanaban et al.
patent: 5945517 (1999-08-01), Nitta et al.
patent: 6005137 (1999-12-01), Moore et al.
patent: 6153733 (2000-11-01), Yukawa et al.
patent: 6362379 (2002-03-01), Moore et al.
patent: 6423467 (2002-07-01), Kawauchi et al.
patent: 6746812 (2004-06-01), Watanabe et al.
patent: 7618762 (2009-11-01), Kunita et al.
patent: 2003/0232940 (2003-12-01), Komoriya et al.
patent: 2003/0236369 (2003-12-01), Komoriya et al.
patent: 2005/0019690 (2005-01-01), Kodama
patent: 2006/0094817 (2006-05-01), Harada et al.
patent: 2007/0134447 (2007-06-01), Kato
patent: 1835342 (2007-09-01), None
patent: H09-208554 (1997-08-01), None
patent: H11-035551 (1999-02-01), None
patent: H11-035552 (1999-02-01), None
patent: H11-035573 (1999-02-01), None
patent: H11-322707 (1999-11-01), None
patent: 10-2003-0076194 (2003-09-01), None
patent: 10-2006-0052244 (2006-05-01), None
patent: WO 2004/074242 (2004-09-01), None
Gil et al., “First Microprocessors with Immersion Lithography”, Proceedings of SPIE, vol. 5754, pp. 119-128, (2005).
Kodama et al., “Synthesis of Novel Fluoropolymer for 157 nm Photoresists by Cyclo-polymerization”, Proceedings of SPIE, vol. 4690, pp. 76-83, (2002).
Office Action (Notice of Allowance) issued in counterpart Korean Patent Application No. 10-2008-0075642, dated Nov. 30, 2010.
Dazai Takahiro
Furuya Sanae
Hirano Tomoyuki
Mori Takayoshi
Takasu Ryoichi
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
Walke Amanda C.
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