Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-05-08
2007-05-08
Wu, David W. (Department: 1713)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S270100, C526S242000, C526S244000, C526S247000
Reexamination Certificate
active
10644953
ABSTRACT:
There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1):and the formula (14):respectively, wherein X1and X2are the same or different and each is H or F; X3is H, F, Cl or CF3; Rf1and Rf2are the same or different and each is a perfluoroalkyl group having1to20carbon atoms; Rf3is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.
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Araki Takayuki
Koh Meiten
Komatsu Yuzo
Daikin Industries Ltd.
Hu Henry S.
Sughrue & Mion, PLLC
Wu David W.
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