Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-06-21
2005-06-21
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S907000, C526S242000, C526S281000
Reexamination Certificate
active
06908724
ABSTRACT:
There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: —(M1)—(M2)—(A)—, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.
REFERENCES:
patent: 3282875 (1966-11-01), Connolly et al.
patent: 3624053 (1971-11-01), Gibbs et al.
patent: 4596864 (1986-06-01), Trotz et al.
patent: 4632881 (1986-12-01), Trotz et al.
patent: 4963463 (1990-10-01), Koshiba et al.
patent: 4985337 (1991-01-01), Sasa et al.
patent: 5212046 (1993-05-01), Lamola et al.
patent: 5229473 (1993-07-01), Kobo et al.
patent: 5292614 (1994-03-01), Ochiai et al.
patent: 5302490 (1994-04-01), Fedynyshyn et al.
patent: 5362606 (1994-11-01), Hartney et al.
patent: 5391465 (1995-02-01), Feely
patent: 5658708 (1997-08-01), Kondo
patent: 5698369 (1997-12-01), Kawamura et al.
patent: 5731123 (1998-03-01), Kawamura et al.
patent: 5738975 (1998-04-01), Nakano et al.
patent: 5756254 (1998-05-01), Kihara et al.
patent: 5780566 (1998-07-01), Mertesdorf
patent: 5837420 (1998-11-01), Aoai et al.
patent: 5840467 (1998-11-01), Kitatani et al.
patent: 5863701 (1999-01-01), Mertesdorf
patent: 5876899 (1999-03-01), Szmanda et al.
patent: 5900346 (1999-05-01), Sinta et al.
patent: 5935733 (1999-08-01), Scott et al.
patent: 5948587 (1999-09-01), Kawabe et al.
patent: 5952150 (1999-09-01), Ohta et al.
patent: 6042991 (2000-03-01), Aoai et al.
patent: 6143472 (2000-11-01), Sumino et al.
patent: 6159655 (2000-12-01), Sato
patent: 6387589 (2002-05-01), Koh et al.
patent: 6468712 (2002-10-01), Fedynyshyn
patent: 6579658 (2003-06-01), Hatakeyama et al.
patent: 6593058 (2003-07-01), Feiring et al.
patent: 2001/0018161 (2001-08-01), Hashimoto
patent: 2002/0009668 (2002-01-01), Nishimura et al.
patent: 2003/0059710 (2003-03-01), Inoue
patent: 2004/0101787 (2004-05-01), Naito et al.
patent: 42 07 261 (1993-09-01), None
patent: 43 19 178 (1993-12-01), None
patent: 0 789 278 (1997-08-01), None
patent: 0 875 789 (1998-11-01), None
patent: 0 880 075 (1998-11-01), None
patent: 1 035 441 (2000-09-01), None
patent: 55-18673 (1980-02-01), None
patent: 55-58211 (1980-04-01), None
patent: 64-43512 (1989-02-01), None
patent: 3-3238 (1991-01-01), None
patent: 9-50129 (1997-02-01), None
patent: 10-111569 (1998-04-01), None
patent: 10-158337 (1998-06-01), None
patent: 11-84663 (1999-03-01), None
patent: 11-133593 (1999-05-01), None
patent: 11-174677 (1999-07-01), None
patent: 11-242337 (1999-09-01), None
patent: 11-327147 (1999-11-01), None
patent: 2000-292926 (2000-10-01), None
patent: 2000-298345 (2000-10-01), None
patent: 2000-321774 (2000-11-01), None
patent: 2001-22076 (2001-01-01), None
patent: 2001-133979 (2001-05-01), None
patent: 2001-154362 (2001-06-01), None
patent: 2001-296662 (2001-10-01), None
patent: 2001-328964 (2001-11-01), None
patent: WO 00/17712 (2000-03-01), None
patent: WO 00/67072 (2000-11-01), None
patent: WO 01/37047 (2001-05-01), None
patent: WO 200273316 (2002-09-01), None
Toriumi et al. “Tetrafluoroethylene-based fluoropolymers for 157 nm Resist Materials”; Journal of Photopolymer Science and Technology vol. 16 No. 4, (2003), 607-614.
International Preliminary Examination Report for PCT/JP01/02897 dated Mar. 19, 2002.
International Search Report for PCT/JP01/02897 dated Jun. 26, 2001.
International Preliminary Examination Report for PCT/JP01/02897 (Japanese language).
Barr et al.; “Perfluoralkyl Derivatives of Nitrogen. Part I. Perfluoro-2-methyl-1 : 2-oxazetidine and Perfluoro(alkylenealkylamines)”; J. Fluorine Chem., pp. 1881-1891 (1955).
Aoyama Hirokazu
Araki Takayuki
Ishikawa Takuji
Koh Meiten
Shimizu Tetsuo
Daikin Industries Ltd.
Thornton Yvette C.
LandOfFree
Fluorine-containing polymer having acid-reactive group and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fluorine-containing polymer having acid-reactive group and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorine-containing polymer having acid-reactive group and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3522277