Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-08-14
2011-10-11
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S907000, C430S910000, C526S245000, C526S329400
Reexamination Certificate
active
08034534
ABSTRACT:
The present invention relates to partially fluorinated (meth)acrylic polymers that can be blended with other (meth)acrylic polymers to provide enhanced surface properties.
REFERENCES:
patent: 6379874 (2002-04-01), Ober et al.
patent: 2002/0051936 (2002-05-01), Harada et al.
patent: 2006/0246373 (2006-11-01), Wang
patent: 2008/0299503 (2008-12-01), Ishiduka et al.
patent: 0 910 587 (2001-12-01), None
patent: WO 98/01478 (1998-01-01), None
patent: WO 99/31144 (1999-06-01), None
patent: WO 00/66575 (2000-11-01), None
patent: WO 02/21213 (2002-03-01), None
patent: WO 2005/031461 (2005-04-01), None
patent: WO 2005/031462 (2005-04-01), None
patent: WO2006/070695 (2006-07-01), None
T.-Y Lee et al., Advances in Resist Technology and Processing XX, Theodore H. Fedynyshyn, Editor, Proceedings of SPIE, vol. 5039 (2003), pp. 548-557.
M. Mishra et al., “Handbook of Radical Vinyl Polymerization”, Marcel Dekker, Inc., 1998. Handbook Not Included.
Y. Wei et al., Advances in Resist Technology and Processing XXIII, edited by Q. Lin, Proc. of SPIE, vol. 6153, 615306, (2006).
Xiang Maoliang, et al., Semifluorinated Groups As Building Blocks for Ordered Polymers, Papers Presented at the Meeting—American Chemical Society, Division of Polymer Chemistry, XX, XX, vol. 39, No. 2, Aug. 1998, pp. 974-975, XP001248281, ISSN: 0032-3934, the whole document.
Hiroshi Ito, Toyoko Imae, Tetsuya Nakamura, Motoyuki Sugiura, Yoshihiro Oshibe: “Self-Association of Water-Soluble Fluorinated Diblock Copolymers in Solutions”, Journal of Colloid and Interface Science, vol. 276, Apr. 21, 2004, pp. 290-298, XP002472763, abstract, figure 1; table 1, paragraph [02.1].
Tadanori Koga, Shuiqin Zhou, Benjamin Chu: “Dynamic Light-Scattering Study of Self-Assembly of Diblock Coploymers in Supercritical Carbon Dioxide”, Applied Optics, vol. 40, No. 24, Aug. 20, 2001, pp. 4170-4178, XP002472764, abstract, p. 4171, col. 1, paragraph 3—col. 2, paragraph 1.
Farnham William Brown
Moudgil Suniti
E.I. du Pont de Nemours and Company
Kaeding Konrad H.
Lee Sin J.
LandOfFree
Fluorinated polymers for use in immersion lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fluorinated polymers for use in immersion lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorinated polymers for use in immersion lithography will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4274369