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T-load microchannel array and fabrication method

Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent

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Tab plater for circuit boards or the like

Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent

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Tandem cell for water cleavage by visible light

Chemistry: electrical and wave energy – Apparatus – Electrolytic
Reexamination Certificate

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Tandem isotachophoresis/zone electrophoresis method and system

Chemistry: electrical and wave energy – Apparatus – Electrophoretic or electro-osmotic apparatus
Reexamination Certificate

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Tank batch electrochemical water treatment process

Chemistry: electrical and wave energy – Apparatus – Electrolytic
Reexamination Certificate

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Tank for an electrolytic cell

Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent

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Tantalum anode for electrolytic devices

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Tantalum sputtering target and method for preparation thereof

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Tantalum sputtering target with fine grains and uniform...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Tantalum-comprising articles

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Target and dark space shield for a physical vapor deposition sys

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Target and process for its production, and method for...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Target and process for its production, and method of forming...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Target arrangement with a circular plate, magnetron for mounting

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Target assemblies of special materials for use in sputter coatin

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Target assembly capable of attaining a high step coverage ratio

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Target assembly comprising, for use in a magnetron-type sputteri

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Target assembly for sputtering magnetic material

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Target assembly for use in forming an overcoat in a magnetic rec

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Target component for cathode sputtering

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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