Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1982-07-09
1983-05-31
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C23C 1500
Patent
active
043859798
ABSTRACT:
In high rate sputter coating sources, it is generally necessary to liquid cool the sputter targets. In one type of source, a cooled wall of a cathode assembly is closely adjacent a sidewall of the sputter target. During normal operation the sidewall of the target expands thermally into tight contact with the cooled wall, whereby cooling of the target is effected without the need for bonding the target to the cooled wall using a solder or other adhesive. Thus, replacement of worn conventional targets is a relatively simple procedure. When the targets are made of certain special materials, such as fragile materials or materials with low coefficients of thermal expansion, target warping, cracking or melting can occur. Such problems are overcome or alleviated by the novel design approach of the present invention, which employs a sputter target assembly in place of a conventional target. The novel sputter target assembly comprises a sputter target of the special material, a retaining member, and a bonding means between the special sputter target and the retaining member. When the special target is worn out, the sputter target assembly is replaced with the same simple procedure used for a conventional target.
REFERENCES:
patent: 3750623 (1973-08-01), Carpenter
patent: 3878085 (1975-04-01), Corbani
patent: 4009090 (1977-02-01), Veigel
patent: 4038171 (1977-07-01), Moss et al.
patent: 4100055 (1978-07-01), Rainey
patent: 4169031 (1979-09-01), Brors
patent: 4198283 (1980-04-01), Class et al.
patent: 4219397 (1980-08-01), Clarke
J. L. Vossen and W. Kern, "Thin Film Processes", 1978, pp. 31-33, 41-42 and 138-141, Academic Press, New York.
J. van Esdonk and J. F. M. Janssen, "Joining a Sputtering Target and a Backing Plate", Jan. 1975, pp. 41-44, Research/Development.
Heisler Joseph A.
Pierce Danny A.
Self Roger D.
Cole Stanley Z.
Demers Arthur P.
Herbert Leon F.
Jepsen Robert L.
Varian Associates Inc.
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