Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-12-19
1998-04-07
Resan, Stevan A.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429806, 20429808, 20429812, 20429813, 20429814, 20429816, 20429817, 20429818, 20429819, C23C 1400
Patent
active
057360200
ABSTRACT:
A target assembly for use in forming a protective overcoat in a magnetic recording medium is described. The assembly includes a centrally positioned target with inner and outer magnetic means adjacent the target. A sputtering shield is positioned between the target and the medium for controlling the amount and angle of material deposition on the medium. The assembly is effective to deposit an overcoat having a greater thickness in the inner landing zone of the medium than in the outer data zone. A method of using the assembly is also disclosed.
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Bourez Allen J.
Lal Brij Bihari
Russak Michael A.
Dehlinger Peter J.
HMT Technology Corporation
Mohr Judy M.
Resan Stevan A.
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