Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1975-03-05
1976-01-20
James, Andrew J.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
29182, 75 5R, 75200, 204292, H01G 900
Patent
active
039341798
ABSTRACT:
An anode for electrolytic devices formed from pressed and sintered compacts of an agglomerated refractory metal powder comprised of polynodal granules of adhered particles with the nodes being of a size the same order of magnitude as the size of the individual particles. Such agglomerated powder is produced by the method including the steps of heating a powder under chemically non-reactive conditions to effect agglomeration between the powder particles, and subsequently crushing the resultant particulate porous agglomerated mass to form said agglomerated polynodal granules. The anodes combine low green and sintered density, equivalent series resistance, dissipation factor and D.C. leakage with a high specific capacitance.
REFERENCES:
patent: 3144328 (1964-08-01), Doty
patent: 3422515 (1969-01-01), Klein
patent: 3667002 (1972-05-01), Klein
patent: 3688161 (1972-08-01), Klein
patent: 3742369 (1973-06-01), Douglass
Fansteel Inc.
James Andrew J.
LandOfFree
Tantalum anode for electrolytic devices does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tantalum anode for electrolytic devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tantalum anode for electrolytic devices will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1700326