Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2011-07-05
2011-07-05
Le, Thao P. (Department: 2818)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S675000, C257SE23145
Reexamination Certificate
active
07972976
ABSTRACT:
Porous dielectric layers are produced by introducing pores in pre-formed composite dielectric layers. The pores may be produced after the barrier material, the metal or other conductive material is deposited to form a metallization layer. In this manner, the conductive material is provided with a relatively smooth continuous surface on which to deposit.
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Draeger Nerissa S.
Hill Richard S.
Humayun Raashina
Ray Gary William
Sun Jianing
Le Thao P.
Novellus Systems Inc.
Weaver Austin Villeneuve & Sampson LLP
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