Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-03-05
2008-10-07
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S281100
Reexamination Certificate
active
07432035
ABSTRACT:
There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure:wherein R1, R2, R3and R5are each a hydrogen atom or a methyl group; R4is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x≦1, 0≦y<1 and 0≦z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3):wherein R8is a hydrogen atom or a methyl group, and R9is a hydrocarbon group of 7 to 16 carbon atoms having an alicyclic lactone structure.
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Hasegawa Etsuo
Iwasa Shigeyuki
Maeda Katsumi
Nakano Kaichiro
Foley & Lardner LLP
NEC Corporation
Walke Amanda C.
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