2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a proc

Details 2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a proc 2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a proc

1981-06-09

1983-02-01

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430286, 430287, 430292, 430294, 430338, 430495, 430541, 430914, 430916, 430920, 430925, 430343, 542400, 542430, 542439, 542454, 542459, 548215, 548219, 548235, G03C 172

Patent

active

043716067

ABSTRACT:
This invention relates to a novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives.

REFERENCES:
patent: 3842019 (1974-10-01), Kropp
patent: 3879356 (1975-04-01), Pacifici
patent: 3954475 (1976-05-01), Bonham et al.
patent: 4189323 (1980-02-01), Buhr

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