2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a proc

Details 2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a proc 2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a proc

Filed on

1981-06-09

Date issued

1983-02-01

Examiner

Kittle, John E.

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Imaging affecting physical property of radiation sensitive...

SubSubClass

Radiation sensitive composition or product or process of making

Other Related Categories

430270, 430286, 430287, 430292, 430294, 430338, 430495, 430541, 430914, 430916, 430920, 430925, 430343, 542400, 542430, 542439, 542454, 542459, 548215, 548219, 548235, G03C 172

Type

Patent

Status

active

Patent number

043716067

Description

ABSTRACT:
This invention relates to a novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives.

REFERENCES:
patent: 3842019 (1974-10-01), Kropp
patent: 3879356 (1975-04-01), Pacifici
patent: 3954475 (1976-05-01), Bonham et al.
patent: 4189323 (1980-02-01), Buhr

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