2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a proc

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430270, 430286, 430287, 430292, 430294, 430338, 430495, 430541, 430914, 430916, 430920, 430925, 430343, 542400, 542430, 542439, 542454, 542459, 548215, 548219, 548235, G03C 172

Type

Patent

Status

active

Patent number

043716067

Description

ABSTRACT:
This invention relates to a novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives.

REFERENCES:
patent: 3842019 (1974-10-01), Kropp
patent: 3879356 (1975-04-01), Pacifici
patent: 3954475 (1976-05-01), Bonham et al.
patent: 4189323 (1980-02-01), Buhr

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