.alpha.,.beta. Diketone containing polymers as positive photores

Details .alpha.,.beta. Diketone containing polymers as positive photores .alpha.,.beta. Diketone containing polymers as positive photores

1984-10-31

1986-06-10

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430311, 526293, 526316, 526284, 526299, 526291, G03C 1495, G03C 516, C08F 1636, C08F 1232

Patent

active

045943095

ABSTRACT:
Photoresist materials that are sensitive in suitable range including the 200 nm to 300 nm ultraviolet radiation range are provided which permit relatively higher resolution and thus a higher information density in microcircuits. The positive photoresist materials are copolymers of

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N. Ogata & K. Nakayama, Polymer Letters, 6, 369, (1968).
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J. B. Conant & R. E. Lutz, J. Am. Chem. Soc., 45, 1303, (1923).
Reimschneider & Claus, Monatsh. Chem. 93, 843 (1962).

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