Autofocusing device and projection exposure apparatus with the s

Automatic focusing apparatus

Auxiliary mask features for enhancing the resolution of photolit

Backside alignment system and method

Balanced positioning system for use in lithographic apparatus

Balanced positioning system for use in lithographic apparatus

Balanced positioning system for use in lithographic apparatus

Balanced positioning system for use in lithographic apparatus

Bearing arrangement for reaction mass in a controlled...

Block exposure of semiconductor wafer

Camera

Capping layer for EUV optical elements

Capping layer for EUV optical elements

Carry device for fine movement

Catadioptric lithography system and method with reticle...

Catadioptric optical system and exposure apparatus having the sa

Catoptric projection optical system, exposure apparatus and...

Certified cells and method of using certified cells for...

Charged particle beam exposure apparatus

Charged-particle-beam microlithographic exposure apparatus...