Block exposure of semiconductor wafer

Details Block exposure of semiconductor wafer Block exposure of semiconductor wafer

1997-07-08

1999-06-29

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Step and repeat

25049223, 430 5, G03B 2742, H01J 37304

Patent

active

059175796

ABSTRACT:
A mask and a block exposure method for transferring a plurality of patterns of the same shape onto an exposure medium while forming the cross-sectional shape of a beam emitted from a light source into a desired pattern. The mask has at least one basic pattern formed by extracting portions of a common shape from pattern information to be exposed. A plurality of blocks are arranged on the mask. Each block includes a plurality of the basic patterns.

REFERENCES:
patent: 5256881 (1993-10-01), Yamazaki et al.
patent: 5438207 (1995-08-01), Itoh et al.
patent: 5439764 (1995-08-01), Alter et al.
patent: 5557110 (1996-09-01), Itoh
patent: 5604059 (1997-02-01), Imura et al.

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