Ultrafine fabrication method

Details Ultrafine fabrication method Ultrafine fabrication method

1996-11-27

1999-08-10

Breneman, Bruce

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

216 51, 216 52, 216 66, 438945, 427533, 427534, 427537, 427552, 4272554, C23C 1600

Patent

active

059354542

ABSTRACT:
A method of fabricating nanometric structures on a substrate by dry etching includes setting the substrate at a temperature at which condensation of etching gas products of etching gas decomposed, recombined and reacted, or products of reactions between the etching gas and substrate material starts to occur, forming condensates at specific locations on the substrate. The condensates form an etching mask for the dry etching process.

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