Two parallel plate electrode type dry etching apparatus
Two step process for cleaning a substrate processing chamber
Ultrasonic assisted etch using corrosive liquids
Ultrasonic glow discharge surface cleaning
Ultrasonic processing of chemical mechanical polishing slurries
Uniform gas distribution in large area plasma source
Uniform gas flow arrangements
Uniform temperature workpiece holder
Unique chemical mechanical planarization approach which...
Universal backplane assembly and methods
Universal mid-frequency matching network
Universal vacuum chamber including equipment modules such as a p
Upper chamber for high density plasma CVD
Upper chamber for high density plasma CVD
Upper electrode backing member with particle reducing features
Use of a chemically active reticle carrier for photomask...
Use of a saw frame with tape as a substrate carrier for wafer le
Vacuum loadlock ultraviolet bake for plasma etch
Vacuum operation apparatus
Vacuum plasma generator