Upper electrode backing member with particle reducing features

Details Upper electrode backing member with particle reducing features Upper electrode backing member with particle reducing features

2006-12-15

2010-12-21

Kackar, Ram N (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With gas inlet structure

C118S715000

Reexamination Certificate

active

07854820

ABSTRACT:
Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.

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International Search Report and Written Opinion dated Mar. 20, 2008 for PCT/US2007/021989.

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