Universal mid-frequency matching network

Details Universal mid-frequency matching network Universal mid-frequency matching network

2006-08-22

2006-08-22

Vo, Tuyet Thi (Department: 2821)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C156S345480, C204S298080, C204S298070, C118S7230VE, C118S7230AN

Reexamination Certificate

active

07094313

ABSTRACT:
A substrate processing system is provided with a processing chamber, an alternating voltage supply, and an impedance matching network. The processing chamber holds a substrate during processing and the alternating voltage supply is connected with the processing chamber to capacitively couple energy to a plasma formed within the processing chamber. The impedance matching network is coupled with the alternating voltage supply and has a variable resistive element and a variable reactive element, whose states respectively define distinct real and imaginary parts of an impedance.

REFERENCES:
patent: 6252354 (2001-06-01), Collins et al.
patent: 6495963 (2002-12-01), Bennett
patent: 6819096 (2004-11-01), Gonzalez et al.

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