Three-mirror system for lithographic projection, and projection

Details Three-mirror system for lithographic projection, and projection Three-mirror system for lithographic projection, and projection

1998-06-17

2000-06-27

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 84, 378 85, G21K 500

Patent

active

060815787

ABSTRACT:
A projection system is described for projecting a mask pattern on a substrate by means of EUV radiation, which projection system consecutively comprises a first concave mirror (1), a convex mirror (2) and a second concave mirror (3). Since the system has a focal length f which is at least equal to +1/2 L, in which L is the length of the system, and the chief ray of the object beam (b.sub.2) leaving the object plane (V) is inclined towards the optical axis (OO'), a compact system is obtained whose first concave mirror (1) has relatively moderate dimensions and in which the axial positions of the concave mirrors (1, 3) are approximately equal, so that these mirrors can be arranged on a common support.

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