X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1996-08-30
1998-05-26
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378210, G21K 500
Patent
active
057578796
ABSTRACT:
An damascene x-ray mask comprises an oxide membrane layer having trenches formed therein defining an x-ray mask pattern. The trenches are filled with collimated, sputtered tungsten sputtered in a relatively high pressure environment. The result is a dense, low stress tungsten film completely filling the trenches. Damascene refers to the process by which the mask is formed. The mask is formed on a silicon substrate and then the substrate is etched away from the bottom side leaving substantially just the oxide layer and the collimated tungsten. The oxide layer is transparent to x-rays and the collimated tungsten layer is opaque to x-rays.
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Joshi Rajiv Vasant
Kimmel Kurt Rudolf
Licata Thomas John
Ryan James Gardner
Church Craig E.
International Business Machines - Corporation
Mortinger, Esq. Alison D.
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