X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1998-06-09
2000-06-06
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
2504922, 359359, 359366, G21K 500
Patent
active
060728523
ABSTRACT:
An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.
REFERENCES:
patent: 5063586 (1991-11-01), Jewell et al.
patent: 5153898 (1992-10-01), Suzuki et al.
patent: 5212588 (1993-05-01), Viswanathan et al.
patent: 5220590 (1993-06-01), Bruning et al.
patent: 5315629 (1994-05-01), Jewell et al.
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5410434 (1995-04-01), Shafer
patent: 5686728 (1997-11-01), Shafer
"Design of reflective relay for soft x-ray lithography" by Rodgers et al.; SPIE vol. 1354, International Lens Design Conference (1990).
"Reflective systems design study for soft x-ray projection lithography" by Jewell et al.; J. Vac. Sci. Technol. B 8 (6) Nov./Dec. 1990.
"Optical system design issues in development of projection camera for EUV lithography" by Jewell; SPIE vol. 2437 May 1995.
"Ring-field EUVL camera with large etendu" by W.C. Sweatt, Sandia National Laboratories, (1996).
Church Craig E.
Grzybicki Daryl
The Regents of the University of California
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