4. Semiconductor device manufacturing: process
  5. Direct application of electrical current
  6. To alter conductivity of fuse or antifuse element
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Metal-to-metal antifuse having improved barrier layer

Semiconductor device manufacturing: process – Direct application of electrical current – To alter conductivity of fuse or antifuse element
Patent

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Method for manufacturing a programmable eraseless memory

Semiconductor device manufacturing: process – Direct application of electrical current – To alter conductivity of fuse or antifuse element
Reexamination Certificate

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Method of forming an aluminum protection guard structure for...

Semiconductor device manufacturing: process – Direct application of electrical current – To alter conductivity of fuse or antifuse element
Reexamination Certificate

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Method of forming closely pitched polysilicon fuses

Semiconductor device manufacturing: process – Direct application of electrical current – To alter conductivity of fuse or antifuse element
Patent

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Method of irreversibly locking a portion of a semiconductor devi

Semiconductor device manufacturing: process – Direct application of electrical current – To alter conductivity of fuse or antifuse element
Patent

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Method of preparing a self-passivating Cu laser fuse

Semiconductor device manufacturing: process – Direct application of electrical current – To alter conductivity of fuse or antifuse element
Reexamination Certificate

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