Tailoring of linewidth through electron beam post exposure
Tailoring of novolak and diazoquinone positive resists by acylat
Tamper-proof document
Tamper-responding encapsulated enclosure having flexible...
Tamperproof document and a process for producing the same
Tannable imaging element
Tannable multi-colored material
Tanning development in low silver photoimaging using polymeric c
Tantalum adhesion layer and reactive-ion-etch process for provid
Tapered edge bead removal process for immersion lithography
Tapered ion implantation with femtosecond laser ablation to...
TARC material for immersion watermark reduction
Technique for enhancing accuracy of critical dimensions of a...
Technique for fabricating phase shift masks using self-aligned s
Technique for making deep microstructures in photoresist
Technique for making electrical ground contact with the intermed
Technique for preparing a photo-mask for imaging three-dimension
Technique for the size reduction of vias and other images in...
Technique of exposing a resist using electron beams having...
Technique of exposing a resist using electron beams having...