Tailoring of novolak and diazoquinone positive resists by acylat

Details Tailoring of novolak and diazoquinone positive resists by acylat Tailoring of novolak and diazoquinone positive resists by acylat

1984-01-30

1986-01-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430169, 430189, 430192, 430296, 430326, G03C 160, G03C 176, G03F 726

Patent

active

045645752

ABSTRACT:
Reduction of the alkaline developer solubility of novolak-diazoquinone positive resists by acylation of phenolic hydroxyl groups of the novolak resin.

REFERENCES:
patent: 3050387 (1962-08-01), Neugebauer et al.
patent: 3802885 (1974-04-01), Lawson et al.
patent: 4089766 (1978-05-01), Paal et al.
patent: 4197128 (1980-04-01), Watanabe et al.
patent: 4308368 (1981-12-01), Kubo et al.
Dinaburg, M. S., "Photosensitive Diazo Cpds.", Focal Press, 1964, pp. 184 and 206.
DeForest, W. S., "Photoresist Materials and Processes", McGraw-Hill Book Co., 1975, pp. 47-59.

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