Technique for enhancing accuracy of critical dimensions of a...

Details Technique for enhancing accuracy of critical dimensions of a... Technique for enhancing accuracy of critical dimensions of a...

2006-05-09

2006-05-09

Barreca, Nicole (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S313000

Reexamination Certificate

active

07041434

ABSTRACT:
In an improved technique for adjusting an etch time of a resist trim process, additional measurement data representing an optical characteristic, such as the reflectivity of an anti-reflective coating, is used. Since the initial thickness of the resist mask features may significantly depend on the optical characteristics of the anti-reflective coating, the additional measurement data allow compensation for process variations more efficiently as compared to the conventional approach.

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