4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mask is exposed to nonimaging radiation
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Anisotropic liquid phase photochemical etch

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
Patent

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Expandable stents and method for making same

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
Patent

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Method of providing a patterned relief of cured photoresist on a

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
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Plasma method for stripping ion implanted photoresist layers

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
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Process for removing a protective coating from a surface of an a

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
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Processes for fabricating device layers with ultrafine features

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
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Scatterometry with grating to observe resist removal rate...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
Reexamination Certificate

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Selective formation of porous silicon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
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