Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
Patent
1995-11-27
1997-12-09
Breneman, R. Bruce
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
Mask is exposed to nonimaging radiation
216102, 427444, 244123, B44C 122, B05D 300
Patent
active
056956592
ABSTRACT:
The present invention relates to a process for removing a protective coating from a surface of an airfoil which process comprises the steps of providing an airfoil having a protective coating to be removed and critical areas which require protection during a coating removal step and masking these critical areas by applying an ultraviolet curable masking material to the critical areas of the airfoil. The process of the present invention further comprises the steps of curing the UV curable masking material using ultraviolet radiation and stripping the protective coating from unmasked portions of the airfoil.
REFERENCES:
patent: 3359129 (1967-12-01), Mao
patent: 3762953 (1973-10-01), Clarke, Jr. et al.
patent: 4530861 (1985-07-01), Sippel et al.
patent: 5216808 (1993-06-01), Martus et al.
Adjodha Michael E.
Breneman R. Bruce
United Technologies Corporation
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