Plasma processing system with locally-efficient inductive...
Plasma reactor having a symmetric parallel conductor coil...
Plasma reactor having a symmetrical parallel conductor coil...
Plasma reactor having an inductive antenna coupling power...
Plasma reactor having RF power applicator and a dual-purpose...
Plasma reactor with a dynamically adjustable plasma source...
Plasma reactor with dynamic RF inductive and capacitive...
Plasma reactor with high selectivity and reduced damage
Plasma source assembly and method of manufacture
Plasma-assisted processing apparatus
Process apparatus and method for improving plasma production...
Process chamber having a voltage distribution electrode
Process depending on plasma discharges sustained by...
Process monitoring apparatus and method
Reactor chamber for an externally excited torroidal plasma...
Reduced impedance chamber
Remote inductively coupled plasma source for CVD chamber...
RF antenna assembly for treatment of inner surfaces of tubes...
RF bias control in plasma deposition and etch systems with...
RF plasma reactor with hybrid conductor and multi-radius...